Fiber-based flexible interference lithography for photonic nanopatterning

Nanopatterning by laser interference lithography: applications to optical devices.

A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in ...

Photonic band gap templating using optical interference lithography.

We describe the properties of three families of inversion-symmetric, large photonic band-gap (PBG) template architectures defined by iso-intensity surfaces in four beam laser interference patterns. These templates can be fabricated by optical interference (holographic) lithography in a suitable polymer photo-resist. PBG materials can be synthesized from these templates using two stages of infil...

Gas Sensor Based on Large Hollow-Core Photonic Bandgap Fiber

One concern in using photonic band-gap fiber (PBGF) as a gas sensor is the response time. In this type of the gas sensors, response time is the time required for gas to diffuse into the hollow-core. So considering a large hollow-core PBGF (HC-PBGF), the response time can be significantly reduced. But in the large HC-PBGF, the fundamental issue is the presence of higher order modes (HOMs). Somet...

Interference Lithography

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...

Interference Lithography for Patterned Media